CVD-SiC Ceramic Material
The unique SiC film formation technology by the CVD (chemical vapor deposition) method realizes low cost products while having high-quality characteristics.
Ferrotec’s Admap SiC products are made with unique CVD-SiC technology, which has been cultivated for over 30 years. These materials have the characteristics of ultra-high purity, high corrosion resistance, high oxidation resistance, high heat resistance, and high wear resistance.
Applications
- Large-scale parts development for a high-temperature annealing device (boat, holder, nozzle)
- Developed narrow-pitch film cassette boat
- Ultra-high purity SiC powder material
- Larger parts for next generation
SiC Physical Properties
| Category | (111) Oriented material | Isotropic material | |
|---|---|---|---|
| Density (g/cm3) | 3.21 | 3.21 | |
| Bending strength, room temperature (MPa) | 382 | 539 | |
| Tensile strength, room temperature (MPa) | 294 | — | |
| Young’s modulus, room temperature (GPa) | 478 | 447 | |
| Hardness | HK : 3500 | — | |
| Thermal expansion coefficient, room temperature~1000°C (1/°C) | 4.5 × 10-5 | 4.5 × 10-5 | |
| Heat conductivity, through-thickness direction (W/m • K) | — | 264 | |
| Heat conductivity, surface direction (W/m • K) | 280 | 236 | |
| Specific heat (J/g • K) | 0.65 | 0.67 | |
| Specific resistance (Ω • cm) | 104 ≤ | ≤102 |
Impurity Concentration Based on Radiation Analysis (unit: ppb)
| Na | Co | K | Cu | Zn | Mn | Fe | Cr |
|---|---|---|---|---|---|---|---|
| <2 | 1.3 | <60 | <50 | 9 | <9 | 35 | 26 |
Impurity Diffusion Coefficient (cm2 sec, at : 1300°C)
| Element | CVD-SiC | Si |
| Fe | 6.5 × 10-14 | 1 × 10-5 |
| Co | 1.3 × 10-13 | 3 × 10-5 |
| Cr | 6.3 × 10-14 | 5 × 10-6 |
| Au | 8.6 × 10-14 | 3 × 10-3 |
Corrosion Resistance*
| Atmosphere | Temperature | Submersion time (h) |
|---|---|---|
| 6N HCl | Boiling point (110°C) | 1470 |
| 9N HNO3 | Boiling point (116°C) | 1470 |
| 19N H2SO4 | Boiling point (128°C) | 1470 |
| Hydrofluoric acid (49%HF) | Room temperature | 168 |
| Fluonitric acid (17%HF+83%HNO3) | Room temperature | 532 |
| Phosphoric acid (85%H3PO4) | 160°C | 168 |
| Nitro-hydrochloric acid | 80°C | 186 |
| Air | 1500°C | 146 |
| HCL gas | 1200°C | 25 |
*Change in mass not observed
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